Fabrication of Transparent and Conductive Al-doped ZnO Films for Solar Cells

被引：4
|
作者：
Tark, Sung Ju [1 ]
Rang, Min gu [1 ]
Kim, Donghwan [1 ]
机构：
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
来源：
KOREAN JOURNAL OF MATERIALS RESEARCH | 2006年 / 16卷 / 07期
关键词：
Al-doped ZnO; rf magnetron sputter; TCO surface textured;
D O I：
10.3740/MRSK.2006.16.7.449
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Al-doped zinc oxide (ZnO:Al) films for transparent electrodes in thin film solar cells were deposited on glass substrates at a low temperature of 200 degrees C by rf magnetron sputtering. The transmittance of the ZnO:Al films in the visible range was 87%. The lowest resistivity of the ZnO:Al films was about 5.8X10(-4)ohm-cm at the Al content of 2.5 wt%. After deposition, the surface of ZnO:Al films were etched in dilute HC1 (0.59$) for the investigation of the change in the electrical properties and the surface morphology due to etching.
引用
收藏
页码：449 / 454
页数：6
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