EXELFS ANALYSIS OF AMORPHOUS AND CRYSTALLINE SILICON-CARBIDE

被引:6
|
作者
MARTIN, JM [1 ]
MANSOT, JL [1 ]
机构
[1] INST PHYS & CHIM MAT,F-44072 NANTES,FRANCE
来源
JOURNAL OF MICROSCOPY-OXFORD | 1991年 / 162卷
关键词
SILICON CARBIDE; ELECTRON ENERGY LOSS; CRYSTALLOGRAPHY;
D O I
10.1111/j.1365-2818.1991.tb03127.x
中图分类号
TH742 [显微镜];
学科分类号
摘要
Core-shell ionization edges from thin specimens of cubic silicon carbide (c-SiC) are studied by means of electron energy-loss spectroscopy (EELS) in a transmission electron microscope (TEM). Special attention is paid to the investigation of extended energy-loss fine structures (EXELFS) to study local order effects around silicon atoms as a function of disorder in SiC. Two forms of SiC were used: c-SiC for the crystalline form, and friction-induced amorphous silicon carbide (a-SiC) for the disordered form. EXELFS are generated by the elastic backscattering of outgoing electron waves by neighbouring atoms. Results show that both Si-K and Si-L edges contain structural information. EXELFS at the Si-K edge can be used to calculate the radial distribution function (RDF) in the same way as extended X-ray absorption fine structures (EXAFS). EXELFS at the Si-L edge can be isolated by digital filtering. The high signal-to-noise ratio at the Si-L edge permits the effect of larger interatomic distances to be observed, and thus the EXELFS technique is of promise for studying the effect of disorder in Si-based ceramic materials with a high spatial resolution (nanometre scale).
引用
收藏
页码:171 / 178
页数:8
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