ABSORPTION OF LASER-LIGHT IN AIR IN THE 193NM RANGE - ANALYSIS OF LASER LOCKING

被引：8
|
作者：
HITCHCOCK, LM [1 ]
KIM, GS [1 ]
RECK, GP [1 ]
ROTHE, EW [1 ]
机构：
[1] WAYNE STATE UNIV,DEPT CHEM ENGN,DETROIT,MI 48202
来源：
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER | 1990年 / 44卷 / 03期
关键词：
D O I：
10.1016/0022-4073(90)90015-X
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Light from a tunable ArF-excimer laser is absorbed by air at 300 K and at higher temperatures. The data are compared with calculations of Lee and Hanson and they also lead to values of the fraction of the laser light that is narrow-band. © 1990.
引用
收藏
页码：373 / 378
页数：6
相关论文
共 50 条
  • [21] PRODUCTION OF PHOTOREACTIVEABLE LESION IN THE YEAST S-CEREVISIAE BY IRRADIATION WITH 193 NM EXCIMER LASER-LIGHT
    WINCKLER, K
    GOLZ, B
    LASKOWSKI, W
    BENDE, T
    PHOTOCHEMISTRY AND PHOTOBIOLOGY, 1988, 47 (02) : 225 - 230
  • [22] PHOTOACOUSTIC INJURY AND BONE HEALING FOLLOWING 193NM EXCIMER LASER ABLATION
    LUSTMANN, J
    ULMANSKY, M
    FUXBRUNNER, A
    LEWIS, A
    LASERS IN SURGERY AND MEDICINE, 1992, 12 (04) : 390 - 396
  • [23] Kinetics of laser induced changes of characteristic optical properties in Lithosil® with 193nm excimer laser exposure
    Natura, U
    Martin, R
    von der Goenna, G
    Kahlke, M
    Fasold, G
    Optical Microlithography XVIII, Pts 1-3, 2005, 5754 : 1312 - 1319
  • [24] Microfiber Fabry-Perot Sensors Inscribed by 193nm Excimer Laser
    Li, Jie
    Shen, Xiang
    Sun, Li-Peng
    Guan, Bai-Ou
    2012 PHOTONICS GLOBAL CONFERENCE (PGC), 2012,
  • [25] Changes in optical interference coatings exposed to 193nm excimer laser radiation
    Heber, J
    Thielsch, R
    Blaschke, H
    Kaiser, N
    Leinhos, U
    Görtler, A
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998, 1999, 3578 : 83 - 96
  • [26] High-resolution microlithography using a 193nm excimer laser source
    Rizvi, NH
    Ashworth, D
    Cashmore, JS
    Gower, MC
    XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE, 1997, 3092 : 471 - 476
  • [27] VITREORETINAL ABLATION IN FLUID MEDIA WITH 193NM EXCIMER-LASER BEAM
    ZAUBERMAN, H
    HEMO, I
    PALANKER, D
    TUROVETS, I
    LEWIS, A
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 1994, 35 (04) : 1261 - 1261
  • [28] PHOTOKERATITIS FROM 193NM ARGON-FLUORIDE LASER-RADIATION
    SLINEY, DH
    KRUEGER, RR
    TROKEL, SL
    RAPPAPORT, KD
    PHOTOCHEMISTRY AND PHOTOBIOLOGY, 1991, 53 (06) : 739 - 744
  • [29] Glass densification under 193nm laser exposure: Experiment and theory.
    Allan, DC
    Smith, C
    Borrelli, NF
    Seward, TP
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 213 : 23 - COMP
  • [30] Laser resistivity and damage causes in coating materials for 193nm by photothermal methods
    Blaschke, H
    Thielsch, R
    Heber, J
    Kaiser, N
    Martin, S
    Welsch, E
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998, 1999, 3578 : 74 - 82
12345