EFFECTIVENESS OF CHARGED VACANCIES IN DIFFUSION OF IMPLANTED BORON IN SILICON

被引：2
|
作者：
RUNOVC, F
机构：
来源：
ELECTRONICS LETTERS | 1980年 / 16卷 / 02期
关键词：
712 Electronic and Thermionic Materials;
D O I：
10.1049/el:19800037
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
8
引用
收藏
页码：49 / 50
页数：2
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