POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS

被引：31

作者：

FLANDERS, DC

SMITH, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期

关键词：

D O I：

10.1116/1.569694

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：995 / 997

页数：3

共 11 条

[1]

BASSOUS E, 1976, SOLID STATE TECHNOL, V19, P55

[2] FABRICATION OF SILICON MOS DEVICES USING X-RAY LITHOGRAPHY [J].

BERNACKI, SE ;

SMITH, HI .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :421-428

[3]

BROERS A, COMMUNICATION

[4]

CAMPBELL DS, 1970, HDB THIN FILM TECHNO, pCH12

[5]

FLANDERS DC, 1976, SOLID STATE RES REPO, P51

[6] NEW X-RAY MASK OF AL-AL2O3 STRUCTURE [J].

FUNAYAMA, T ;

TAKAYAMA, Y ;

INAGAKI, T ;

NAKAMURA, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1324-1324

[7] X-RAY LITHOGRAPHY .1. DESIGN CRITERIA FOR OPTIMIZING RESIST ENERGY-ABSORPTION .2. PATTERN REPLICATION WITH POLYMER MASKS [J].

GREENEICH, JS .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :434-439

[8] HIGH-SPEED REPLICATION OF SUBMICRON FEATURES ON LARGE AREAS BY X-RAY LITHOGRAPHY [J].

MAYDAN, D ;

COQUIN, GA ;

MALDONADO, JR ;

SOMEKH, S ;

LOU, DY ;

TAYLOR, GN .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :429-433

[9] APPLICATION OF MOIRE TECHNIQUES IN SCANNING ELECTRON-BEAM LITHOGRAPHY AND MICROSCOPY [J].

SMITH, HI ;

CHINN, SR ;

DEGRAFF, PD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1262-1265

[10]

SPEARS DL, 1972, SOLID STATE TECHNOL, V15, P21

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