CHLORINE CONCENTRATION PROFILES IN O2-HCL AND H2O-HCL THERMAL SILICON-OXIDES USING SIMS MEASUREMENTS

被引：31

作者：

DEAL, BE ^{[1
]}

HURRLE, A ^{[1
]}

SCHULZ, MJ ^{[1
]}

机构：

[1] FRAUNHOFER SOC,INST APPL SOLID STATE PHYS,D-7800 FREIBURG,FED REP GER

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 12期

关键词：

D O I：

10.1149/1.2131356

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：2024 / 2027

页数：4

相关论文

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