GROWTH OF THIN-FILM NIOBIUM AND NIOBIUM OXIDE LAYERS BY MOLECULAR-BEAM EPITAXY

被引：23
|
作者：
PETRUCCI, M
PITT, CW
REYNOLDS, SR
MILLEDGE, HJ
MENDELSSOHN, MJ
DINEEN, C
FREEMAN, WG
机构：
[1] UNIV LONDON UNIV COLL,DEPT GEOL SCI,CRYSTALLOG UNIT,LONDON WC1E 6BT,ENGLAND
[2] GEC HIRST RES CTR,WEMBLEY,MIDDX,ENGLAND
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 03期
关键词：
D O I：
10.1063/1.341140
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：900 / 909
页数：10
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