MO-CVD GROWTH OF GAP AND GAA1P

被引:26
|
作者
BENEKING, H
ROEHLE, H
机构
关键词
D O I
10.1016/0022-0248(81)90274-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:79 / 86
页数:8
相关论文
共 50 条
  • [31] MICROWAVE PERFORMANCE OF GaAs PBT's FABRICATED FROM MO-CVD WAFERS.
    Takanashi, Yoshifumi
    Asai, Hiromitsu
    Ando, Seigo
    Sugiura, Hideo
    Honda, Takashi
    Susa, Nobuhiko
    Japanese Journal of Applied Physics, Part 2: Letters, 1986, 25 (02): : 111 - 113
  • [32] Deposition of bismuth-titanate films with liquid-delivery spin MO-CVD
    Schwarzkopf, J.
    Dirsyte, R.
    Rossberg, M.
    Wagner, G.
    Fornari, R.
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 144 (1-3): : 132 - 137
  • [33] MESA WAVEGUIDE GAAS-GAALAS INJECTION-LASER GROWN BY MO-CVD
    SCIFRES, DR
    BURNHAM, RD
    STREIFER, W
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (12) : 218 - 219
  • [34] Mo-CVD法制备GaAs和CdTe的特种材料研究
    丁永庆
    苏建农
    王周成
    彭瑞伍
    陈纪安
    关振东
    杨臣华
    上海金属有色分册., 1987, (05) : 10 - 14
  • [35] COUPLED MULTIPLE STRIPE QUANTUM WELL INJECTION-LASERS GROWN BY MO-CVD
    SCIFRES, DR
    BURNHAM, RD
    STREIFER, W
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (10) : 1673 - 1674
  • [36] Properties of ZnO films prepared by MO-CVD under oxygen rich condition on sapphire substrate
    Kashiwaba, Y
    Haga, K
    Watanabe, H
    Zhang, BP
    Segawa, Y
    Matsushita, K
    11TH INTERNATIONAL CONFERENCE ON II-VI COMPOUNDS (II-VI 2003), PROCEEDINGS, 2004, 1 (04): : 912 - 915
  • [37] PHOTOELECTROCHEMICAL PROPERTIES OF THIN GAMMA-FE203 FILMS FORMED BY MO-CVD TECHNIQUE
    HARA, N
    SUGIMOTO, K
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1988, 52 (02) : 189 - 198
  • [38] PHONON-SIDEBAND MO-CVD QUANTUM-WELL ALXGA1-XAS-GAAS HETEROSTRUCTURE LASER
    HOLONYAK, N
    KOLBAS, RM
    LAIDIG, WD
    ALTARELLI, M
    DUPUIS, RD
    DAPKUS, PD
    APPLIED PHYSICS LETTERS, 1979, 34 (08) : 502 - 505
  • [39] Structural and optical properties of Zn(1-x)CdxO solid solutions grown on ZnO substrates by using MO-CVD
    Lusson, A.
    Haneche, N.
    Sallet, V.
    Galtier, P.
    Munoz-Sanjose, V.
    Zuniga-Perez, J.
    Agouram, S.
    Bastos Segura, J. A.
    Leroy, E.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 53 (01) : 158 - 162
  • [40] A self-aligned cap technology for Cu damascene interconnects by MO-CVD ZrN film
    Kondo, H
    Nakao, Y
    Suzuki, T
    Sakai, H
    Shimizu, N
    PROCEEDINGS OF THE IEEE 2002 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE, 2002, : 292 - 294