RESISTIVITY OF DOPED POLYCRYSTALLINE SILICON FILMS

被引：53

作者：

FRIPP, AL

SLACK, LH

机构：

[1] LANGLEY RES CTR,HAMPTON,VA 23365

[2] VIRGINIA POLYTECH INST & STATE UNIV,DEPT MET & CERAMICS,BLACKSBURG,VA 23601

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 01期

关键词：

D O I：

10.1149/1.2403390

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：145 / 146

页数：2

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