RESEARCH AND DEVELOPMENT ON LSI IN ELECTRICAL COMMUNICATION LABORATORIES

被引：0

作者：

TOYODA, H

KAWAMATA, A

WATANABE, M

HAYASHI, T

机构：

[1] MUSASHINO ELECT COMMUN LAB,DIV TECHNOL,MUSASHINO,TOKYO 180,JAPAN

[2] IBARAKI ELECT COMMUN LAB,IBARAKI,JAPAN

来源：

REVIEW OF THE ELECTRICAL COMMUNICATIONS LABORATORIES | 1979年 / 27卷 / 1-2期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1 / 9

页数：9

共 16 条

[1]

AKAZAWA Y, 1978, ISSCC FAM, V15

[2]

ARAI E, 1977, ESSCRC VLSI SESSION

[3]

HAYASHI T, 1978, 8TH INT C EL BEAM SC, P876

[4]

HONMA Y, 1976, OCT INT SWITCH S

[5] POLY(VINYLETHERS) AS X-RAY RESISTS [J].

IMAMURA, S ;

SUGAWARA, S ;

MURASE, K .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) :1139-1140

[6] POLY (FLUORO METHACRYLATE) AS HIGHLY SENSITIVE, HIGH CONTRAST POSITIVE RESIST [J].

KAKUCHI, M ;

SUGAWARA, S ;

MURASE, K ;

MATSUYAMA, K .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (10) :1648-1651

[7]

MAMAZAKI S, 1978, J VAC SCI TECH, V15, P987

[8]

MUKAI H, 1977, ISSCC WPM, V7

[9]

MUKAI H, 1968, CONTROLLED SATURATIO

[10]

MURASE K, 1977, P INT C MICROLITHOGR, P261

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