EFFECTS OF DEPOSITION TEMPERATURE OF INSULATOR FILMS ON THE ELECTRICAL CHARACTERISTICS OF INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS

被引：19
作者：
IWASE, Y
ARAI, F
SUGANO, T
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 17期
关键词：
D O I：
10.1063/1.99138
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1437 / 1438
页数：2
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