EFFECTS OF DEPOSITION TEMPERATURE OF INSULATOR FILMS ON THE ELECTRICAL CHARACTERISTICS OF INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS

被引：19

|

作者：

IWASE, Y

ARAI, F

SUGANO, T

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 17期

关键词：

D O I：

10.1063/1.99138

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1437 / 1438

页数：2

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