LUBRICATION WITH SPUTTERED MOS2 FILMS - PRINCIPLES, OPERATION, AND LIMITATIONS

被引：51
作者：
SPALVINS, T
机构：
[1] National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio
来源：
JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE | 1992年 / 1卷 / 03期
关键词：
D O I：
10.1007/BF02652388
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This article reviews the present practices, limitations, and understanding of thin sputtered MoS2 films. Sputtered MoS2 films can exhibit remarkable tribological properties such as ultra-low friction coefficients (0.01) and enhanced wear lives (millions of cycles) when used in vacuum or dry air. To achieve these favorable tribological characteristics, the sputtering conditions during deposition must be optimized for adequate film adherence and appropriate structure (morphology) and composition.
引用
收藏
页码：347 / 352
页数：6
相关论文
共 22 条
[1]   MORPHOLOGICAL PROPERTIES OF SPUTTERED MOS2 FILMS [J].
BUCK, V .
WEAR, 1983, 91 (03) :281-288
[2]   PREPARATION AND PROPERTIES OF DIFFERENT TYPES OF SPUTTERED MOS2 FILMS [J].
BUCK, V .
WEAR, 1987, 114 (03) :263-274
[3]   STOICHIOMETRY AND FRICTION PROPERTIES OF SPUTTERED MOSX LAYERS [J].
DIMIGEN, H ;
HUBSCH, H ;
WILLICH, P ;
REICHELT, K .
THIN SOLID FILMS, 1985, 129 (1-2) :79-91
[4]   ELECTRONIC-STRUCTURE AND LUBRICATION PROPERTIES OF MOS2 - A QUALITATIVE MOLECULAR-ORBITAL APPROACH [J].
FLEISCHAUER, PD ;
LINCE, JR ;
BERTRAND, PA ;
BAUER, R .
LANGMUIR, 1989, 5 (04) :1009-1015
[5]   FUNDAMENTAL-ASPECTS OF THE ELECTRONIC-STRUCTURE, MATERIALS PROPERTIES AND LUBRICATION PERFORMANCE OF SPUTTERED MOS2 FILMS [J].
FLEISCHAUER, PD .
THIN SOLID FILMS, 1987, 154 (1-2) :309-322
[6]   CHEMICAL AND STRUCTURAL EFFECTS ON THE LUBRICATION PROPERTIES OF SPUTTERED MOS2 FILMS [J].
FLEISCHAUER, PD ;
BAUER, R .
TRIBOLOGY TRANSACTIONS, 1988, 31 (02) :239-250
[7]  
HILTON MR, 1989, MATER RES SOC S P, V140, P227
[8]   SLIDING LIFE ENHANCEMENT OF A WS2 SPUTTERED FILM BY ION-BEAM MIXING [J].
HIRANO, M ;
MIYAKE, S .
APPLIED PHYSICS LETTERS, 1985, 47 (07) :683-685
[9]   FRICTION-REDUCING COATINGS BY DUAL FAST ATOM BEAM TECHNIQUE [J].
KUWANO, H ;
NAGAI, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (06) :2993-2996
[10]   OXYGEN SUBSTITUTION IN SPUTTER-DEPOSITED MOS2 FILMS STUDIED BY EXTENDED X-RAY ABSORPTION FINE-STRUCTURE, X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-DIFFRACTION [J].
LINCE, JR ;
HILTON, MR ;
BOMMANNAVAR, AS .
SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3) :640-651
123