GROWTH OF SIO2 THIN-FILM BY DOUBLE-EXCITATION PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION INCORPORATED WITH MICROWAVE EXCITATION OF OXYGEN

被引：11

作者：

INOUE, K

NAKATANI, Y

OKUYAMA, M

HAMAKAWA, Y

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 11期

关键词：

D O I：

10.1063/1.342067

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6496 / 6501

页数：6

共 13 条

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