SOLID-PHASE LATERAL EPITAXIAL-GROWTH ONTO ADJACENT SIO2 FILM FROM AMORPHOUS-SILICON DEPOSITED ON SINGLE-CRYSTAL SILICON SUBSTRATE

被引：25
作者：
OHMURA, Y
MATSUSHITA, Y
KASHIWAGI, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 03期
关键词：
D O I：
10.1143/JJAP.21.L152
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：L152 / L154
页数：3
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