SOLUTION-PHASE REACTIVITY AS A GUIDE TO THE LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF EARLY-TRANSITION-METAL NITRIDE THIN-FILMS

被引：90

作者：

FIX, RM ^{[1
]}

GORDON, RG ^{[1
]}

HOFFMAN, DM ^{[1
]}

机构：

[1] HARVARD UNIV,DEPT CHEM,12 OXFORD ST,CAMBRIDGE,MA 02138

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1990年 / 112卷 / 21期

关键词：

D O I：

10.1021/ja00177a075

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

[No abstract available]

引用

页码：7833 / 7835

页数：3

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