INVESTIGATION OF ELECTRICAL-CONDUCTION IN RF SPUTTERED SILICON DIOXIDE

被引：3

作者：

MOEENZIAI, B ^{[1
]}

机构：

[1] TH DELFT, LAB TECH NATUURKUNDE, DELFT, NETHERLANDS

来源：

THIN SOLID FILMS | 1974年 / 22卷 / 02期

关键词：

D O I：

10.1016/0040-6090(74)90011-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：S31 / S36

页数：6

共 50 条

[1] ELECTRICAL-CONDUCTION IN THIN ZINC RF SPUTTERED FILMS
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