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CHANNEL ELECTRON CONDUCTION IN LASER-ANNEALED POLYCRYSTALLINE SILICON METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
被引:10
作者
:
LEE, HS
论文数:
0
引用数:
0
h-index:
0
LEE, HS
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1981年
/ 38卷
/ 10期
关键词
:
D O I
:
10.1063/1.92157
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:770 / 772
页数:3
相关论文
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POLY-SILICON INSULATED-GATE FIELD-EFFECT TRANSISTOR
[J].
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MONOLITHIC INTEGRATED-CIRCUIT FABRICATED IN LASER-ANNEALED POLYSILICON
[J].
KAMINS, TI
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机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
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LEE, KF
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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;
GIBBONS, JF
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h-index:
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机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
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SARASWAT, KC
论文数:
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
SARASWAT, KC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(01)
:290
-293
[4]
FIELD-EFFECTS IN POLYCRYSTALLINE-SILICON FILMS
[J].
KAMINS, TI
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SOLID-STATE ELECTRONICS,
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[5]
THIN-FILM MOSFETS FABRICATED IN LASER-ANNEALED POLYCRYSTALLINE SILICON
[J].
LEE, KF
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0
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机构:
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
LEE, KF
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GIBBONS, JF
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0
机构:
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
GIBBONS, JF
;
SARASWAT, KC
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[J].
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ED12
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:248
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[7]
ELECTRICAL PROPERTIES OF POLYCRYSTALLINE SILICON FILMS
[J].
SETO, JYW
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机构:
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
SETO, JYW
.
JOURNAL OF APPLIED PHYSICS,
1975,
46
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[8]
SILICON-ON-INSULATOR MOSFETS FABRICATED ON LASER-ANNEALED POLYSILICON ON SIO2
[J].
TASCH, AF
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机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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;
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
GIBBONS, JF
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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.
ELECTRONICS LETTERS,
1979,
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(14)
:435
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[9]
ELECTRON MOBILITY STUDIES IN SURFACE SPACE-CHARGE LAYERS IN VAPOR-DEPOSITED CDS FILMS
[J].
WAXMAN, A
论文数:
0
引用数:
0
h-index:
0
WAXMAN, A
;
HENRICH, VE
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;
SHALLCROSS, FV
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SHALLCROSS, FV
;
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;
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JOURNAL OF APPLIED PHYSICS,
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←
1
→
共 9 条
[1]
POLY-SILICON INSULATED-GATE FIELD-EFFECT TRANSISTOR
[J].
FA, CH
论文数:
0
引用数:
0
h-index:
0
FA, CH
;
JEW, TT
论文数:
0
引用数:
0
h-index:
0
JEW, TT
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
:290
-+
[2]
Grove A. S., 1967, PHYS TECHNOL S
[3]
MONOLITHIC INTEGRATED-CIRCUIT FABRICATED IN LASER-ANNEALED POLYSILICON
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
;
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
GIBBONS, JF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
;
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
SARASWAT, KC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(01)
:290
-293
[4]
FIELD-EFFECTS IN POLYCRYSTALLINE-SILICON FILMS
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
KAMINS, TI
.
SOLID-STATE ELECTRONICS,
1972,
15
(07)
:789
-&
[5]
THIN-FILM MOSFETS FABRICATED IN LASER-ANNEALED POLYCRYSTALLINE SILICON
[J].
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
LEE, KF
;
GIBBONS, JF
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
GIBBONS, JF
;
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
HEWLETT PACKARD CO,LABS,PALO ALTO,CA 94304
SARASWAT, KC
.
APPLIED PHYSICS LETTERS,
1979,
35
(02)
:173
-175
[6]
ELECTRON AND HOLE MOBILITIES IN INVERSION LAYERS ON THERMALLY OXIDIZED SILICON SURFACES
[J].
LEISTIKO, O
论文数:
0
引用数:
0
h-index:
0
LEISTIKO, O
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SAH, CT
论文数:
0
引用数:
0
h-index:
0
SAH, CT
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(05)
:248
-+
[7]
ELECTRICAL PROPERTIES OF POLYCRYSTALLINE SILICON FILMS
[J].
SETO, JYW
论文数:
0
引用数:
0
h-index:
0
机构:
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
GM CORP,RES LABS,ELECTR DEPT,WARREN,MI 48090
SETO, JYW
.
JOURNAL OF APPLIED PHYSICS,
1975,
46
(12)
:5247
-5254
[8]
SILICON-ON-INSULATOR MOSFETS FABRICATED ON LASER-ANNEALED POLYSILICON ON SIO2
[J].
TASCH, AF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
TASCH, AF
;
HOLLOWAY, TC
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
HOLLOWAY, TC
;
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
GIBBONS, JF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
.
ELECTRONICS LETTERS,
1979,
15
(14)
:435
-437
[9]
ELECTRON MOBILITY STUDIES IN SURFACE SPACE-CHARGE LAYERS IN VAPOR-DEPOSITED CDS FILMS
[J].
WAXMAN, A
论文数:
0
引用数:
0
h-index:
0
WAXMAN, A
;
HENRICH, VE
论文数:
0
引用数:
0
h-index:
0
HENRICH, VE
;
SHALLCROSS, FV
论文数:
0
引用数:
0
h-index:
0
SHALLCROSS, FV
;
BORKAN, H
论文数:
0
引用数:
0
h-index:
0
BORKAN, H
;
WEIMER, PK
论文数:
0
引用数:
0
h-index:
0
WEIMER, PK
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(01)
:168
-+
←
1
→