SOME PROPERTIES OF ION-PLATED SILVER FILMS

被引：0

作者：

YOSHIHARA, H ^{[1
]}

KIUCHI, M ^{[1
]}

AOKI, T ^{[1
]}

UMEMURA, S ^{[1
]}

机构：

[1] NIPPON TELEG & TEL PUBL CORP, MUSASHINO ELECT COMMUN LAB, MUSASHINO, TOKYO 180, JAPAN

来源：

JOURNAL OF THE JAPAN INSTITUTE OF METALS | 1977年 / 41卷 / 10期

关键词：

Compendex;

D O I：

10.2320/jinstmet1952.41.10_999

中图分类号：

学科分类号：

摘要：

SILVER PLATING

引用

页码：999 / 1006

页数：8

共 9 条

[1] PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION [J].

AISENBERG, S ;

CHABOT, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :104-107

[2]

AOKI T, 1976, 8TH P INT C EL CONT, P488

[3] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].

BLAND, RD ;

KOMINIAK, GJ ;

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674

[4] DEPOSITION OF MULTICOMPONENT PHASES BY ION PLATING [J].

HARKER, HR ;

HILL, RJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1395-&

[5] The measurement of particle size by the X-ray method [J].

Jones, FW .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1938, 166 (A924) :0016-0043

[6]

KAELLE EF, HDB XRAYS

[7]

Mattox D.M., 1964, ELECTROCHEM TECHNOL, V2, P95

[8] FUNDAMENTALS OF ION PLATING [J].

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :47-52

[9] ADHERENCE AND POROSITY IN ION PLATED GOLD [J].

SCHROEDER, CF ;

MCDONALD, JE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :889-+

← 1 →