LOW-TEMPERATURE DEPOSITION OF SILICON DIOXIDE FILMS FROM ELECTRON-CYCLOTRON RESONANT MICROWAVE PLASMAS

被引：60

作者：

HERAK, TV ^{[1
]}

CHAU, TT ^{[1
]}

THOMSON, DJ ^{[1
]}

MEJIA, SR ^{[1
]}

BUCHANAN, DA ^{[1
]}

KAO, KC ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 06期

关键词：

D O I：

10.1063/1.342815

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2457 / 2463

页数：7

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