THE USE OF SR FOR THE CREATION OF A TOPOLOGY IN LAYERS OF METAL PHTHALOCYANINES

被引：2

作者：

REZNIKOVA, EF ^{[1
]}

PROKHOROVA, SA ^{[1
]}

BASOVA, TV ^{[1
]}

AJUPOV, BM ^{[1
]}

NAZMOV, VP ^{[1
]}

MAKAROV, OA ^{[1
]}

IGUMENOV, IK ^{[1
]}

KRIEGER, JH ^{[1
]}

机构：

[1] BUDKER INST NUCL PHYS,NOVOSIBIRSK 630090,RUSSIA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1995年 / 359卷 / 1-2期

关键词：

D O I：

10.1016/0168-9002(94)01385-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The influence of synchrotron radiation (SR) on vacuum-deposited layers of copper and aluminium phthalocyanines is investigated. For the creation of patterns in these layers X-ray radiation exposure and vacuum thermal development were used. It was established, that the layers of copper phthalocyanine (CuPc) possess the properties of both positive and negative vacuum X-ray resist upon radiation exposures of 5 kJ/cm(3) and 35 kJ/cm(3) respectively. The layers of aluminium phthalocyanine (AlPcX, where X = Cl, F, OH) possess the properties of only negative vacuum X-ray resists. The possibility of the creation of a submicron topology in layers of metal phthalocyanines has been demonstrated.

引用

页码：415 / 418

页数：4

共 12 条

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