STRESS DISTRIBUTIONS IN SILICON CRYSTAL SUBSTRATES WITH THIN-FILMS

被引：64

作者：

ISOMAE, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 04期

关键词：

D O I：

10.1063/1.329006

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2782 / 2791

页数：10

共 15 条

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