LASER AND ELECTRON-BEAM ANNEALING OF BURIED LAYERS PRODUCED BY MEV ION-IMPLANTATION

被引：0
|
作者：
BAUMANN, H
BETHGE, K
FUSS, L
KRIMMEL, EF
LANGFELD, R
LUTSCH, A
RUNGE, H
WITKOWSKI, S
机构：
[1] UNIV FRANKFURT,INST KERNPHYS,D-6000 FRANKFURT 70,FED REP GER
[2] MAX PLANCK INST PLASMA PHYS,D-8046 GARCHING,FED REP GER
[3] SIEMEN AG,FORSCH LAB,D-8000 MUNCHEN 83,FED REP GER
[4] RAND AFRIKAANS UNIV,JOHANNESBURG,SOUTH AFRICA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C364 / C364
页数：1
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