VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN

被引：26

作者：

FUJINAMI, M ^{[1
]}

MATSUDA, T ^{[1
]}

TAKAMOTO, K ^{[1
]}

YODA, H ^{[1
]}

ISHIGA, T ^{[1
]}

SAITOU, N ^{[1
]}

KOMODA, T ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571195

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：941 / 945

页数：5

共 10 条

[1]

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[2]

FUJINAMI M, 1979, REV ELEC COMMUN LAB, V27, P97

[3] DESIGN OF A VARIABLE-APERTURE PROJECTION AND SCANNING SYSTEM FOR ELECTRON-BEAM [J].

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[4] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

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[5]

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[7] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .2. ELECTRON OPTICS [J].

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UNO, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1087-1093

[8] ELECTRON-BEAM LITHOGRAPHY USING VECTOR-SCAN TECHNIQUES [J].

SPETH, AJ ;

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[9] PRECISION ELECTRON-BEAM EXPOSURE SYSTEM, EB52 [J].

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[10]

VARNELL GR, 1980, J VAC SCI TECHNOL, V16, P1787

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