PREFERENTIAL DEPOSITION OF SILVER INDUCED BY LOW-ENERGY GOLD ION IMPLANTATION

被引：4

作者：

STROUD, PT

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(72)90256-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：273 / &

共 15 条

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