TARGET CONTAMINATION BY CATHODE SPUTTERING IN BROAD BEAM ION SOURCES

被引：4
作者：
VITKAVAGE, DJ [1 ]
MAYER, TM [1 ]
机构：
[1] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27514
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 01期
关键词：
D O I：
10.1116/1.574999
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：154 / 155
页数：2
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    [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 1855 - 1859
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  • [3] Heath B. A., 1984, VLSI ELECTRONICS MIC, V8, P365
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    KAUFMAN, HR
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    HARPER, JME
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 725 - 736
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