EFFECT OF SIDE WALL ROUGHNESS IN BURIED-CHANNEL WAVE-GUIDES

被引：79
作者：
LADOUCEUR, F
LOVE, JD
SENDEN, TJ
机构：
[1] AUSTRALIAN NATL UNIV,INST ADV STUDIES,DEPT APPL MATH,CANBERRA,ACT 0200,AUSTRALIA
[2] AUSTRALIAN NATL UNIV,CTR OPT SCI,INST ADV STUDIES,CANBERRA,ACT 0200,AUSTRALIA
来源：
IEE PROCEEDINGS-OPTOELECTRONICS | 1994年 / 141卷 / 04期
关键词：
ATOMIC FORCE MICROSCOPE; OPTICAL WAVE-GUIDES; SCATTERING LOSS;
D O I：
10.1049/ip-opt:19941085
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channed waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.
引用
收藏
页码：242 / 248
页数：7
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