ANODIC OXIDATION OF ALUMINUM, CHROMIUM, HAFNIUM, NIOBIUM, TANTALUM, TITANIUM, VANADIUM, AND ZIRCONIUM AT VERY LOW CURRENT DENSITIES

被引：108
作者：
JOHANSEN, HA
ADAMS, GB
VANRYSSELBERGHE, P
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1957年 / 104卷 / 06期
关键词：
D O I：
10.1149/1.2428577
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：339 / 346
页数：8
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