ANODIC OXIDATION OF ALUMINUM, CHROMIUM, HAFNIUM, NIOBIUM, TANTALUM, TITANIUM, VANADIUM, AND ZIRCONIUM AT VERY LOW CURRENT DENSITIES

被引：108

作者：

JOHANSEN, HA

ADAMS, GB

VANRYSSELBERGHE, P

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1957年 / 104卷 / 06期

关键词：

D O I：

10.1149/1.2428577

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：339 / 346

页数：8

相关论文

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[1] ANODIC POLARIZATION OF ZIRCONIUM AT LOW POTENTIALS - FORMATION RATES, FORMATION FIELD, ELECTROLYTIC PARAMETERS, AND FILM THICKNESSES OF VERY THIN OXIDE FILMS
ADAMS, GB
VANRYSSELBERGHE, P
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (09) : 502 - 511
[2] Brown R.H., 1938, T ELECTROCHEM SOC, V74, P495, DOI [10.1149/1.3494016, DOI 10.1149/1.3494016]
[3] BROWN RH, 1950, CORROSION, V6, P186
[4] About the chemical nature of the oxide layers, which are formed at anodic polarization on the metals aluminum, zirconium, titanium and tantalum.
Burgers, W. G.
Claassen, A.
Zernike, J.
[J]. ZEITSCHRIFT FUR PHYSIK, 1932, 74 (9-10): : 593 - 603
[5] THEORY OF THE OXIDATION OF METALS
CABRERA, N
MOTT, NF
[J]. REPORTS ON PROGRESS IN PHYSICS, 1948, 12 : 163 - 184
[6] IONIC CURRENT AND FILM GROWTH OF THIN OXIDE LAYERS ON ALUMINIUM
CHARLESBY, A
[J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (400): : 317 - 329
[7] IONIC CURRENTS IN THIN FILMS OF ZIRCONIUM OXIDE
CHARLESBY, A
[J]. ACTA METALLURGICA, 1953, 1 (03): : 340 - 347
[8] CHARLESBY A, 1951, MR714 AT EN RES EST
[9] DELTOMBE E, 1956, 29 CTR BELG DET CORR
[10] A THEORY OF THE KINETICS OF FORMATION OF ANODE FILMS AT HIGH FIELDS
DEWALD, JF
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (01) : 1 - 6

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