ION NITRIDING OF ARMCO IRON IN VARIOUS GLOW-DISCHARGE REGIONS

This paper presents the first results of a study of plasma nitriding in various regions of a d.c. glow discharge, i.e. on the cathode, on the anode, and on a substrate isolated from the cathode and anode (at plasma potential). The results obtained reveal differences in the growth kinetics and surface morphology of the nitriding layers, depending on the region where the nitriding process took place. The aim of this work was to study the role of low temperature plasma in the plasma nitriding process. The processes were carried out in an apparatus for plasma treatment with a hot anode.