CARRIER-INDUCED CHANGE IN REFRACTIVE-INDEX OF INP, GAAS, AND INGAASP

被引:846
作者
BENNETT, BR
SOREF, RA
DELALAMO, JA
机构
[1] USAF,ROME AIR DEV CTR,SOLID STATE SCI DIRECTORATE,BEDFORD,MA 01731
[2] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139
关键词
D O I
10.1109/3.44924
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have theoretically estimated the change in refractive index Δn produced by injection of free carriers in InP, GaAs, and InGaAsP. Bandfilling (Burstein-Moss effect), band-gap shrinkage, and free-carrier absorption (plasma effect) were included. Carrier concentrations of 1016/cm3 to 1019cm3 and photon energies of 0.8 to 2.0 eV were considered. Predictions of Δ n are in reasonably good agreement with the limited experimental data available. Refractive index changes as large as 10−2 are predicted for carrier concentrations of I018/cm3, suggesting that low-loss optical phase modulators and switches using carrier injection are feasible in these materials. © 1990 IEEE
引用
收藏
页码:113 / 122
页数:10
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