SILICON-BASED, PROTECTIVE TRANSPARENT MULTILAYER COATINGS DEPOSITED AT HIGH-RATE ON OPTICAL POLYMERS BY DUAL-MODE MW/RF PECVD

被引：32

作者：

ROSTAING, JC ^{[1
]}

COEURET, F ^{[1
]}

DREVILLON, B ^{[1
]}

ETEMADI, R ^{[1
]}

GODET, C ^{[1
]}

HUC, J ^{[1
]}

PAREY, JY ^{[1
]}

YAKOVLEV, VA ^{[1
]}

机构：

[1] ECOLE POLYTECH,PHYS INTERFACES & COUCHES MINCES LAB,F-91128 PALAISEAU,FRANCE

来源：

THIN SOLID FILMS | 1993年 / 236卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(93)90642-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Protective transparent coatings have been deposited on polycarbonate and CR 39 by dual mode MW/r.f. plasma-enhanced chemical vapour deposition from silane. The layer sequence consists of appropriate adhesion-promoting pretreatment, an intermediate columnar silica layer and a hard, densified nitride layer with adjusted intrinsic compressive stress by means of a particular coupling of the MW and r.f, plasmas. The deposition rate was up to 250 nm min(-1) for silica. Optical filters fabricated by similar processes can be included in the coating structure. Superior abrasion resistance and thermal variation endurance are obtained without the need for any wet process step.

引用

页码：58 / 63

页数：6

共 13 条

[1] OPTICAL-PROPERTIES OF THIN-FILMS [J].

ASPNES, DE .

THIN SOLID FILMS, 1982, 89 (03) :249-262

[2] INFLUENCE OF DEPOSITION TEMPERATURE, GAS-PRESSURE, GAS-PHASE COMPOSITION, AND RF FREQUENCY ON COMPOSITION AND MECHANICAL-STRESS OF PLASMA SILICON-NITRIDE LAYERS [J].

CLAASSEN, WAP ;

VALKENBURG, WGJN ;

WILLEMSEN, MFC ;

VANDERWIJGERT, WM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (04) :893-898

[3] OPTICAL-PROPERTIES OF PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITED SILICON-OXYNITRIDE FILMS [J].

CROS, Y ;

ROSTAING, JC ;

PEISNER, J ;

LEVEQUE, G ;

ANCE, C .

JOURNAL OF APPLIED PHYSICS, 1987, 62 (11) :4538-4544

[4] ON THE STRUCTURE OF LOW-TEMPERATURE PECVD SILICON DIOXIDE FILMS [J].

DEVINE, RAB .

JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (11) :1299-1301

[5] DETERMINATION OF OPTICAL-CONSTANTS OF THIN-FILM COATING MATERIALS BASED ON INVERSE SYNTHESIS [J].

DOBROWOLSKI, JA ;

HO, FC ;

WALDORF, A .

APPLIED OPTICS, 1983, 22 (20) :3191-3200

[6] INVESTIGATION OF THE ADHESION MECHANISMS OF SILICON ALLOY THIN-FILMS ON POLYMER SUBSTRATES BY IR ELLIPSOMETRY [J].

DREVILLON, B ;

ROSTAING, JC ;

VALLON, S .

THIN SOLID FILMS, 1993, 236 (1-2) :204-208

[7] PROPERTIES OF SI-RICH SINX-H FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION [J].

KAYA, C ;

MA, TP ;

CHEN, TC ;

BARKER, RC .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (08) :3949-3957

[8] ATOMIC MICROSTRUCTURE AND ELECTRONIC-PROPERTIES OF A-SINX-H DEPOSITED BY PECVD [J].

MAEDA, K ;

UMEZU, I .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 :883-886

[9] ION-BASED METHODS FOR OPTICAL THIN-FILM DEPOSITION [J].

MARTIN, PJ .

JOURNAL OF MATERIALS SCIENCE, 1986, 21 (01) :1-25

[10]

MOISAN M, 1992, PLASMA TECHNOLOGY, V4, P123

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