THERMOPHORETIC DEPOSITION OF SMALL PARTICLES IN THE MODIFIED CHEMICAL VAPOR-DEPOSITION (MCVD) PROCESS

被引：96
作者：
WALKER, KL
GEYLING, FT
NAGEL, SR
机构：
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1980年 / 63卷 / 9-10期
关键词：
D O I：
10.1111/j.1151-2916.1980.tb10763.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：552 / 558
页数：7
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