USE OF ION-BEAM ASSISTED DEPOSITION TO MODIFY THE MICROSTRUCTURE AND PROPERTIES OF THIN-FILMS

Ion beam assisted deposition, the bombardment of a thin film with a beam of energetic particles during deposition, provides a powerful technique for modifying the microstructure and properties of thin films and coatings. Various experimental approaches used for ion beam assisted deposition are described and the physical basis for the effects is examined. Observations on modification of nucléation and growth behaviour, microstructure development, compound synthesis, and applications to the modification of properties such as intrinsic stress, adhesion, surface mechanical properties, corrosion and oxidation resistance, optical properties, and electrical properties, are reviewed. © 1990 Maney Publishing.