IMPACT OF ELECTRON-SCATTERING ON LINEWIDTH CONTROL IN ELECTRON-BEAM LITHOGRAPHY

被引：28
作者：
GREENEICH, JS
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期
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D O I：
10.1116/1.570286
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：1749 / 1753
页数：5
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