SELECTED PROPERTIES OF PYROLYTIC TA2O5 FILMS

[1] PHOTOCONDUCTION IN ANODIC TA2O5 [J]. PHYSICAL REVIEW, 1952, 88 (01): : 58 - 59

[2] COLBY JW, 1969, THIN FILM DIELECTRIC

[3] CULLEN GW, 1970, RCA REV, V31, P355

[4] Drude P., 1890, PHYS CHEM, V39, P481, DOI [10.1002/andp.18902750402, DOI 10.1002/ANDP.18902750402]

[5] INFRA-RED ABSORPTION IN SEMICONDUCTORS [J]. REPORTS ON PROGRESS IN PHYSICS, 1956, 19 : 107 - 155

[6] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) : 542 - +

[7] HORTL P, 1969, Z NATUFORSCH A, V24, P296

[8] KASSTAD P, 1962, J ELECTROCHEM SOC, V109, P776

[9] Kihara-Morishita H., 1970, Thin Solid Films, V6, pr29, DOI 10.1016/0040-6090(70)90043-X

[10] KING BW, 1957, BMI1106, P8

[1] PHOTOCONDUCTION IN ANODIC TA2O5 [J]. PHYSICAL REVIEW, 1952, 88 (01): : 58 - 59

[2] COLBY JW, 1969, THIN FILM DIELECTRIC

[3] CULLEN GW, 1970, RCA REV, V31, P355

[4] Drude P., 1890, PHYS CHEM, V39, P481, DOI [10.1002/andp.18902750402, DOI 10.1002/ANDP.18902750402]

[5] INFRA-RED ABSORPTION IN SEMICONDUCTORS [J]. REPORTS ON PROGRESS IN PHYSICS, 1956, 19 : 107 - 155

[6] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) : 542 - +

[7] HORTL P, 1969, Z NATUFORSCH A, V24, P296

[8] KASSTAD P, 1962, J ELECTROCHEM SOC, V109, P776

[9] Kihara-Morishita H., 1970, Thin Solid Films, V6, pr29, DOI 10.1016/0040-6090(70)90043-X

[10] KING BW, 1957, BMI1106, P8