FACTORS INFLUENCING THE PRESENCE AND DETECTION OF COMPOSITIONAL GRADING AT SEMICONDUCTOR HETERO-EPITAXIAL INTERFACES

被引:15
作者
LYONS, MH
机构
关键词
D O I
10.1016/0022-0248(89)90531-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:339 / 347
页数:9
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