ACTIVE-NITROGEN-DOPED P-TYPE ZNSE GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY FOR BLUE-LIGHT-EMITTING DEVICES

被引:13
作者
IMAIZUMI, M
ENDOH, Y
OHTSUKA, K
ISU, T
NUNOSHITA, M
机构
[1] Semiconductor Research Laboratory, Mitsubishi Electric Corporation, Amagasaki, Hyogo, 661
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1993年 / 32卷 / 12A期
关键词
ZNSE; H(2)SE; ACTIVE-NITROGEN DOPING; GAS-SOURCE MOLECULAR BEAM EPITAXY; LIGHT-EMITTING DIODE;
D O I
10.1143/JJAP.32.L1725
中图分类号
O59 [应用物理学];
学科分类号
摘要
Active-nitrogen-doped p-type ZnSe epitaxial layers were grown by gas-source molecular beam epitaxy using H2Se. Electrical properties of the N-doped ZnSe layers changed drastically depending on the growth temperature and the VI/II ratio. With decreasing growth temperature, the net acceptor concentration increased. At the growth temperature of 300-degrees-C, the net acceptor concentration was as high as 1.02 x 10(18) cm-3. Using this technique, p-n junction diodes with an active layer of ZnCdSe/ZnSe multiple quantum wells were fabricated. These diodes emitted clearly visible blue light (477 nm) at room temperature.
引用
收藏
页码:L1725 / L1727
页数:3
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