INSITU CHEMICAL-ANALYSIS IN THIN-FILM PRODUCTION USING SOFT-X-RAY EMISSION-SPECTROSCOPY

被引：17
作者：
GEORGSON, M
BRAY, G
CLAESSON, Y
NORDGREN, J
RIBBING, CG
WASSDAHL, N
机构：
[1] Uppsala University, Center for Science and Technology, 534
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词：
D O I：
10.1116/1.577379
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A feasibility study has been made on the use of soft x-ray emission spectroscopy for in situ characterization and on line production monitoring of thin films. Thin films of Ti, TiN, and TiO2 were produced by reactive magnetron sputtering under various conditions. During or directly after deposition the films were subjected to spectral analysis of soft x-ray emission in the 380-550 eV range with the use of a grazing incidence instrument. The experiments showed that, even with a general purpose instrument, it is possible to obtain spectra with sufficient quality to reveal details about the chemical state of the constituents in less than 30 s. The sensitivity of the method allows control of the stoichiometry of the film as well as detection of small amounts of impurities of, e.g., oxygen in TiN.
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页码：638 / 645
页数：8
相关论文
共 21 条
[1]  
BONNELLE C, 1982, ADV XRAY SPECTROSCOP
[2]  
CHAPIN J, 1979, Patent No. 4166784
[3]   MONITORING OF THIN-FILM SPUTTERING BY SOFT-X-RAY EMISSION-SPECTROSCOPY [J].
CLAESSON, Y ;
WASSDAHL, N ;
GEORGSON, M ;
BRAY, G ;
RIBBING, CG ;
NORDGREN, J .
VACUUM, 1990, 41 (4-6) :1275-1278
[4]   ENHANCED SOFT-X-RAY DETECTION EFFICIENCIES FOR IMAGING MICROCHANNEL PLATE DETECTORS [J].
FRASER, GW ;
BARSTOW, MA ;
WHITELEY, MJ ;
WELLS, A .
NATURE, 1982, 300 (5892) :509-511
[5]  
GEORGSON M, 1988, 6TH P INT C ION PLAS, P436
[6]   OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION [J].
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05) :1718-1729
[7]   MICROSTRUCTURE AND PHYSICAL-PROPERTIES OF POLYCRYSTALLINE METASTABLE TI0.5AL0.5N ALLOYS GROWN BY DC MAGNETRON SPUTTER DEPOSITION [J].
HAKANSSON, G ;
SUNDGREN, JE ;
MCINTYRE, D ;
GREENE, JE ;
MUNZ, WD .
THIN SOLID FILMS, 1987, 153 :55-65
[8]   EVIDENCE FOR ELECTRON-INDUCED X-RAY-EMISSION IN SPUTTERING DEPOSITION [J].
HECQ, M .
APPLIED PHYSICS LETTERS, 1986, 49 (08) :445-446
[9]   GLASS SUBSTRATE CHEMICAL-ANALYSIS USING ELECTRON-INDUCED X-RAY-EMISSION IN SPUTTER DEPOSITION [J].
HECQ, M .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1989, 44 (04) :419-425
[10]   SPECTROMETRY OF X-RAY-INDUCED EMISSION IN SPUTTERING DEPOSITION - A NEW TECHNIQUE FOR INSITU THIN-FILM CHEMICAL-ANALYSIS [J].
HECQ, M ;
LELEUX, J .
ANALYTICAL CHEMISTRY, 1987, 59 (03) :440-443
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