ON THE FORMATION OF THICK AND MULTIPLE LAYER SIMOX STRUCTURES AND THEIR APPLICATIONS

被引：4
|
作者：
NAMAVAR, F
CORTESI, E
SOREF, RA
SIOSHANSI, P
机构：
来源：
ION BEAM PROCESSING OF ADVANCED ELECTRONIC MATERIALS | 1989年 / 147卷
关键词：
D O I：
10.1557/PROC-147-241
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：241 / 246
页数：6
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