EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER

被引：269
作者：
KAWAMURA, Y
TOYODA, K
NAMBA, S
机构：
来源：
APPLIED PHYSICS LETTERS | 1982年 / 40卷 / 05期
关键词：
D O I：
10.1063/1.93108
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：374 / 375
页数：2
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