HIGH-DOSE IMPLANTATION OF EU INTO ALPHA-FE

被引：3

作者：

LADSTATTER, H

STAHL, B

GEISS, O

GELLERT, R

HARTICK, M

KLINGELHOFER, G

SCHWALBACH, P

KANKELEIT, E

机构：

[1] Institut für Kernphysik, TH Darmstadt, Darmstadt

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 76卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(93)95117-N

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

For the case of an Eu implanted alpha-iron foil the technique of depth selective conversion electron Mossbauer spectroscopy will be discussed. The sample was prepared by the implantation of 3.6 X 10(17)/cm2 Eu-151 with an ion energy of 1.5 MeV. Due to the sputter process the Eu profile should reach the sample surface. The thickness of this layer has been estimated to be about 1700 angstrom.

引用

页码：29 / 30

页数：2

共 5 条

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HYPERFINE INTERACTIONS, 1990, 58 (1-4) :2547-2553

[5]

STAHL B, 1993, IN PRESS RAD EFF DEF

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