CONDUCTANCE CONSIDERATIONS IN THE REACTIVE ION ETCHING OF HIGH ASPECT RATIO FEATURES

被引：158

作者：

COBURN, JW

WINTERS, HF

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 26期

关键词：

D O I：

10.1063/1.101937

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2730 / 2732

页数：3

共 16 条

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