DEPOSITION OF TIN, TIC, AND TIO2 FILMS BY FILTERED ARC EVAPORATION

A filtered arc deposition process was used in the reactive deposition of macroparticle-free TiO2, TiN, and TiC films. The TiO2 films were reactively deposited by arc evaporation of titanium in an oxygen atmosphere. The films deposited onto glass substrates heated to 350-degrees-C had a rutile structure and a refractive index n6.33 of 2.735 and extinction coefficient k6.33 of 0.007. Films of TiN and TiC were prepared by reactive evaporation in nitrogen and methane respectively. The lattice parameters and preferred orientations of the deposited films were measured as a function of negative substrate bias. The films were characterized by microhardness measurements, X-ray photoelectron spectroscopy and X-ray diffraction.