SILICON DIMETHYLAMIDO COMPLEXES AND AMMONIA AS PRECURSORS FOR THE ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE THIN-FILMS

被引：32
作者：
GORDON, RG
HOFFMAN, DM
RIAZ, U
机构：
来源：
CHEMISTRY OF MATERIALS | 1990年 / 2卷 / 05期
关键词：
D O I：
10.1021/cm00011a002
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：480 / 482
页数：3
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