ION-IMPLANTATION EFFECTS IN NONCRYSTALLINE SIO2

被引:128
作者
ARNOLD, GW [1 ]
机构
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
关键词
D O I
10.1109/TNS.1973.4327397
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:220 / 223
页数:4
相关论文
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