首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
EPITAXIAL-GROWTH OF COSI2 ON (001) AND (111) SI
被引:0
作者
:
BULLELIEUWMA, CWT
论文数:
0
引用数:
0
h-index:
0
BULLELIEUWMA, CWT
VANOMMEN, AH
论文数:
0
引用数:
0
h-index:
0
VANOMMEN, AH
LANGEREIS, C
论文数:
0
引用数:
0
h-index:
0
LANGEREIS, C
HORNSTRA, J
论文数:
0
引用数:
0
h-index:
0
HORNSTRA, J
机构
:
来源
:
INSTITUTE OF PHYSICS CONFERENCE SERIES
|
1988年
/ 93期
关键词
:
D O I
:
暂无
中图分类号
:
O4 [物理学];
学科分类号
:
0702 ;
摘要
:
引用
收藏
页码:81 / 82
页数:2
相关论文
共 5 条
[1]
STUDY OF COBALT-DISILICIDE FORMATION FROM COBALT MONOSILICIDE
[J].
APPELBAUM, A
论文数:
0
引用数:
0
h-index:
0
APPELBAUM, A
;
KNOELL, RV
论文数:
0
引用数:
0
h-index:
0
KNOELL, RV
;
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(06)
:1880
-1886
[2]
LATTICE IMAGING OF SILICIDE SILICON INTERFACES
[J].
CHEN, LJ
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
CHEN, LJ
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
MAYER, JW
;
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
TU, KN
;
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
SHENG, TT
.
THIN SOLID FILMS,
1982,
93
(1-2)
:91
-97
[3]
HIGH-RESOLUTION ELECTRON-MICROSCOPY OF THE INITIAL-STAGES OF COSI2 FORMATION ON SI(111)
[J].
DANTERROCHES, C
论文数:
0
引用数:
0
h-index:
0
DANTERROCHES, C
.
SURFACE SCIENCE,
1986,
168
(1-3)
:751
-763
[4]
THE EFFECTS OF NUCLEATION AND GROWTH ON EPITAXY IN THE COSI2/SI SYSTEM
[J].
GIBSON, JM
论文数:
0
引用数:
0
h-index:
0
GIBSON, JM
;
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
BEAN, JC
;
POATE, JM
论文数:
0
引用数:
0
h-index:
0
POATE, JM
;
TUNG, RT
论文数:
0
引用数:
0
h-index:
0
TUNG, RT
.
THIN SOLID FILMS,
1982,
93
(1-2)
:99
-108
[5]
MURARKA SP, 1983, SILICIDES VLSI APPLI
←
1
→
共 5 条
[1]
STUDY OF COBALT-DISILICIDE FORMATION FROM COBALT MONOSILICIDE
[J].
APPELBAUM, A
论文数:
0
引用数:
0
h-index:
0
APPELBAUM, A
;
KNOELL, RV
论文数:
0
引用数:
0
h-index:
0
KNOELL, RV
;
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
MURARKA, SP
.
JOURNAL OF APPLIED PHYSICS,
1985,
57
(06)
:1880
-1886
[2]
LATTICE IMAGING OF SILICIDE SILICON INTERFACES
[J].
CHEN, LJ
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
CHEN, LJ
;
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
MAYER, JW
;
TU, KN
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
TU, KN
;
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853
SHENG, TT
.
THIN SOLID FILMS,
1982,
93
(1-2)
:91
-97
[3]
HIGH-RESOLUTION ELECTRON-MICROSCOPY OF THE INITIAL-STAGES OF COSI2 FORMATION ON SI(111)
[J].
DANTERROCHES, C
论文数:
0
引用数:
0
h-index:
0
DANTERROCHES, C
.
SURFACE SCIENCE,
1986,
168
(1-3)
:751
-763
[4]
THE EFFECTS OF NUCLEATION AND GROWTH ON EPITAXY IN THE COSI2/SI SYSTEM
[J].
GIBSON, JM
论文数:
0
引用数:
0
h-index:
0
GIBSON, JM
;
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
BEAN, JC
;
POATE, JM
论文数:
0
引用数:
0
h-index:
0
POATE, JM
;
TUNG, RT
论文数:
0
引用数:
0
h-index:
0
TUNG, RT
.
THIN SOLID FILMS,
1982,
93
(1-2)
:99
-108
[5]
MURARKA SP, 1983, SILICIDES VLSI APPLI
←
1
→