NEGATIVE-TONE DEEP-ULTRAVIOLET RESISTS CONTAINING BENZYLIC CROSS-LINKERS - EXPERIMENTAL AND SIMULATION STUDIES OF THE CROSS-LINKING PROCESS

被引：9
|
作者：
ZENK, AM
NEUREUTHER, AR
LEE, SM
FRECHET, JMJ
机构：
[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN,BERKELEY,CA 94720
[2] CORNELL UNIV,DEPT CHEM,ITHACA,NY 14853
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期
关键词：
D O I：
10.1116/1.587453
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：3851 / 3856
页数：6
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