Calculation of Desorption Parameters for Mg/Si(111) System

被引：3
作者：
Dotsenko, S. A. [1 ]
Galkin, N. G. [1 ]
Galkin, K. N. [1 ]
机构：
[1] FEB RAS, Inst Automat & Control Proc, Dept Surface Sci, 5 Radio Str, Vladivostok 690041, Russia
来源：
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2009年 / 7卷
关键词：
Metallic films; Thermal desorption; Alkaline earth metals; Silicon; Reflection spectroscopy; Magnesium; Desorption; parameters; Si(111);
D O I：
10.1380/ejssnt.2009.816
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The method for calculation of desorption parameters developed for differential reflection spectroscopy is presented. It enables to study desorption and to control phase composition of film simultaneously. Spectra of differential reflectance Delta R/R of the film are initial data for the method. The method was used for Mg/Si(111) system. The desorption parameters for bulk Mg film were calculated and limitations of the method were found.
引用
收藏
页码：816 / 820
页数：5
相关论文
共 5 条
[1]   PERTURBATIVE APPROACH TO THE CALCULATION OF THE ELECTRIC-FIELD NEAR A METAL-SURFACE [J].
BAGCHI, A ;
BARRERA, RG ;
RAJAGOPAL, AK .
PHYSICAL REVIEW B, 1979, 20 (12) :4824-4838
[2]   In situ differential reflectance spectroscopy study of early stages of beta-FeSi2 silicide formation [J].
Dotsenko, Sergey Andreevich ;
Galkin, Nickolay Gennadievich ;
Gouralnik, Alexander Samuilovich ;
Koval, Ludmila Valerievna .
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2005, 3 :113-119
[3]   In situ differential reflectance spectroscopy study of solid phase epitaxy in Si(111)-Fe and Si(111)-Cr systems [J].
Dotsenko, Sergey Andreevich ;
Galkin, Nickolay Gennadievich ;
Koval, Ludmila Valerievna ;
Polyarnyi, Vyacheslav Olegovich .
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2006, 4 :319-329
[4]   DIFFERENTIAL REFLECTION SPECTROSCOPY OF VERY THIN SURFACE FILMS [J].
MCINTYRE, JD ;
ASPNES, DE .
SURFACE SCIENCE, 1971, 24 (02) :417-&
[5]  
Yu P., 1996, FUNDAMENTALS SEMICON, DOI DOI 10.1007/978-3-662-03313-5
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