TIME-RESOLVED REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION MONITORING OF THE SURFACE STRUCTURAL-CHANGES OF SI(111) DURING Q-SWITCHED LASER (532 NM) ANNEALING

被引:3
作者
KITRIOTIS, D
AOYAGI, Y
机构
[1] RIKEN, The Institute of Physical and Chemical Research, Wako-shi, Saitama
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1993年 / 32卷 / 3B期
关键词
SI(111); Q-SWITCHED LASER; ANNEALING; TIME-RESOLVED; RHEED; DEBYE-WALLER EFFECT; TRANSIENT PHASE;
D O I
10.1143/JJAP.32.L441
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanosecond surface structural changes during Q-switched laser annealing of a Si{111} crystal are studied with two-dimensional, time-resolved reflection of high-energy electron diffraction (RHEED) patterns obtained in real time synchronously with time-resolved optical reflectivity measurements. The detected Debye-Waller effect indicates the existence of a thermal process that results in melting of the surface. A transient crystalline surface phase is observed prior to recrystallization of the initial superstructure.
引用
收藏
页码:L441 / L443
页数:3
相关论文
共 15 条
[1]   DYNAMICS OF Q-SWITCHED LASER ANNEALING [J].
AUSTON, DH ;
GOLOVCHENKO, JA ;
SIMONS, AL ;
SURKO, CM ;
VENKATESAN, TNC .
APPLIED PHYSICS LETTERS, 1979, 34 (11) :777-779
[2]   NEW RECONSTRUCTIONS ON SILICON (111) SURFACES [J].
BECKER, RS ;
GOLOVCHENKO, JA ;
HIGASHI, GS ;
SWARTZENTRUBER, BS .
PHYSICAL REVIEW LETTERS, 1986, 57 (08) :1020-1023
[3]   LOW-ENERGY ELECTRON-DIFFRACTION DURING PULSED LASER ANNEALING - A TIME-RESOLVED SURFACE STRUCTURAL STUDY [J].
BECKER, RS ;
HIGASHI, GS ;
GOLOVCHENKO, JA .
PHYSICAL REVIEW LETTERS, 1984, 52 (04) :307-310
[4]   THE SI(111) 7X7 TO 1X1 TRANSITION [J].
BENNETT, PA ;
WEBB, MW .
SURFACE SCIENCE, 1981, 104 (01) :74-104
[5]   TIME RESOLVED X-RAY-DIFFRACTION STUDY OF LASER ANNEALING IN SILICON AT GRAZING-INCIDENCE [J].
BUSCHERT, JR ;
TISCHLER, JZ ;
MILLS, DM ;
ZHAO, Q ;
COLELLA, R .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (08) :3523-3525
[6]   BUCKLING RECONSTRUCTION ON LASER-ANNEALED SI(111) SURFACES [J].
CHABAL, YJ ;
ROWE, JE ;
ZWEMER, DA .
PHYSICAL REVIEW LETTERS, 1981, 46 (09) :600-603
[7]   ULTRAHIGH-VACUUM PICOSECOND LASER-DRIVEN ELECTRON-DIFFRACTION SYSTEM [J].
ELSAYEDALI, HE ;
HERMAN, JW .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (06) :1636-1647
[8]   TIME-RESOLVED REFLECTIVITY MEASUREMENTS ON SILICON AND GERMANIUM USING A PULSED EXCIMER KRF LASER-HEATING BEAM [J].
JELLISON, GE ;
LOWNDES, DH ;
MASHBURN, DN ;
WOOD, RF .
PHYSICAL REVIEW B, 1986, 34 (04) :2407-2415
[9]   TIME-RESOLVED ELLIPSOMETRY MEASUREMENTS OF THE OPTICAL-PROPERTIES OF SILICON DURING PULSED EXCIMER LASER IRRADIATION [J].
JELLISON, GE ;
LOWNDES, DH .
APPLIED PHYSICS LETTERS, 1985, 47 (07) :718-721
[10]   NANOSECOND LASER-DRIVEN REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION SYSTEM PROVIDING DIGITAL IMAGING IN REAL-TIME [J].
KITRIOTIS, D ;
OZASA, K ;
MEGURO, T ;
SHIMODA, S ;
NISHI, K ;
AOYAGI, Y .
APPLIED PHYSICS LETTERS, 1992, 60 (13) :1636-1638