STRUCTURE AND PROPERTIES OF NI-TIC CERMET FILMS FORMED BY ION PLATING

被引:6
作者
ISHIDA, A
OGAWA, K
KIMURA, T
TAKEI, A
机构
[1] National Research Institute for Metals, Meguroku, Tokyo, 2-3-12, Nakameguro
关键词
D O I
10.1016/0040-6090(90)90275-I
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
NiTiC cermet films with Ti:Ni ratios of 0.35 and 3 were deposited by activated reactive evaporation. Electron microscopy study revealed that the films were fine-grained mixtures of nickel and TiC. Among them a nickel-rich cermet film exhibited good adhesion, high hardness and high ductility. © 1990.
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页码:69 / 76
页数:8
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